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Publications by Shigeki HIRASAWA
Measurement of Thermal Radiative Properties of Silicon Wafers With Oxide Film and Nitride Film at 950°C
JSME international journal. Ser. 2, Fluids engineering, heat transfer, power, combustion, thermophysical properties
Visualization of Numerical Analysis Process Dy Excel Proceedings - Steady-State Analysis Using a Nonuniform Grid -
Journal of the Visualization Society of Japan
Effect of Surface Tension on Laminar Film Condensation : Study of Condensate Film in a Small Groove
Transactions of the Japan Society of Mechanical Engineers
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Characteristics of Polycrystalline Silicon Thin-Film Transistors With Thin Oxide/Nitride Gate Structures
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Nonvolatile Polycrystalline Silicon Thin-Film-Transistor Memory With Oxide/Nitride/Oxide Stack Gate Dielectrics and Nanowire Channels
Applied Physics Letters
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Hydrothermal Formation and Properties of Chromium Oxide Film.
Review of High Pressure Science and Technology/Koatsuryoku No Kagaku To Gijutsu
Materials Science
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Condensed Matter Physics
Effect of Thermal History on Pyrolysis of Si-C-O Amorphous Fiber Coated With Oxide Film
Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of Materials
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Condensed Matter Physics
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Properties of Silicon Dioxide Film Deposited by PECVD at Low Temperature/Pressure
Metallurgical and Materials Engineering
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Thermal Conductivity and Specific Heat of Thin-Film Amorphous Silicon
Physical Review Letters
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Comparison of Silicon Oxide and Silicon Carbide Absorber Materials in Silicon Thin-Film Solar Cells
EPJ Photovoltaics
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Renewable Energy
Sustainability
Optical
Electrical
Magnetic Materials
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the Environment
Hydrophilic Silicon Oxide Film by Pulsed Plasma CVD
Shinku
Tunable Hybrid Silicon Nitride and Thin-Film Lithium Niobate Electro-Optic Microresonator
Optics Letters
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