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Publications by Shih-Hsiung Chan
Cation Source Dependence of $\Bf Ga_{0.5}In_{0.5}P$ Growth Rate by Low-Pressure Metalorganic Chemical Vapor Deposition
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
Astronomy
Physics
Related publications
Magnetic Properties of Semiconducting Spinel CdCr2S4 Nanostructured Films Grown by Low-Pressure MetalOrganic Chemical Vapor Deposition
Germanium Thin Film Formation by Low-Pressure Chemical Vapor Deposition
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Low Temperature Fabrication of Thermochromic VO2thin Films by Low-Pressure Chemical Vapor Deposition
RSC Advances
Chemistry
Chemical Engineering
Process Control in Metalorganic Chemical Vapor Deposition of CdTe
Materials Transactions, JIM
Thermal Expansion of Low-Pressure Chemical Vapor Deposition Polysilicon Films
Journal of Materials Research
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Low Pressure Chemical Vapor Deposition of A-Si:H From Disilane
High-Rate Deposition of Amorphous Silicon Film by Atmospheric Pressure Plasma Chemical Vapor Deposition. (2nd Report). Investigation for Higher Deposition Rate.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Epitaxial Lateral Overgrowth of A-Plane GaN by Metalorganic Chemical Vapor Deposition
Journal of Applied Physics
Astronomy
Physics
Intrinsic P-Type ZnO Films Fabricated by Atmospheric Pressure Metal Organic Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
