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Publications by T. I. Kim

Characteristics of Inductively Coupled Cl2/BCl3 Plasmas During GaN Etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Related publications

Etch Characteristics of Optical Waveguides Using Inductively Coupled Plasmas With Multidipole Magnets

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Interface Trap States in Al2O3/AlGaN/GaN Structure Induced by Inductively Coupled Plasma Etching of AlGaN Surfaces

Physica Status Solidi (A) Applications and Materials Science

Electronic Engineering

Condensed Matter Physics

Materials Chemistry

Magnetic Materials

English

Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Electrochemical and Solid-State Letters

English

Removal of Anodic Aluminum Oxide Barrier Layer on Silicon Substrate by Using Cl2/BCl3 Neutral Beam Etching

Journal of the Electrochemical Society

Condensed Matter Physics

Electrochemistry

Materials Chemistry

Magnetic Materials

Renewable Energy

the Environment

English

Characterization of BCl3/N2 Plasmas

Journal of Applied Physics

English

AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD and BCl3 Gate Recess Etching

ECS Transactions

English

Effects of H2Addition in Magnetized Inductively Coupled C2F6Plasma Etching of Silica Aerogel Film

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

English

Fabrication of Low Loss Polymer Inverse Ridge Waveguide Using Inductively Coupled Plasma Etching

Chinese Optics Letters

Electronic Engineering

Molecular Physics,

Magnetic Materials

English

Influence of Reactor Wall Conditions on Etch Processes in Inductively Coupled Fluorocarbon Plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English