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Publications by T. Isshiki

Wurtzite [11-20]-Oriented AlFeN Films Prepared by RF Sputtering

English

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Cr-N Films Prepared by RF Magnetron Sputtering.

English

Diffusion Coefficient of Hydrogen in Palladium Films Prepared by RF Sputtering

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Mechanics of Materials

Materials Chemistry

Condensed Matter Physics

English

Thermoelectric Properties of Zn0.98Al0.02O Thin Films Prepared by RF Magnetron Sputtering

Journal of the Ceramic Society of Japan

Materials Chemistry

Condensed Matter Physics

English

Structure of Indium Nitride Thin Films Prepared by RF-magnetron Sputtering

Acta Crystallographica Section A Foundations of Crystallography

English

PROPERTIES OF PURE SILICON AMORPHOUS FILMS PREPARED BY Rf-Bias SPUTTERING

Le Journal de Physique Colloques

English

Nano-Morphological, Magnetic and Structural Properties of Ni Films Prepared by RF-Sputtering

Engineering Journal

English

Hydrogen Influence on Gallium Arsenide Thin Films Prepared by Rf-Magnetron Sputtering Technique

Brazilian Journal of Physics

English

Effects of Substrate Bias on the Structure of ZnO Films Prepared by Reactive RF Sputtering.

English

Effects of Substrate Bias Voltages on Hardness of BCN Films Prepared by RF Magnetron Sputtering

Transactions of the Materials Research Society of Japan

English