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Publications by T. Kauerauf
Degradation and Breakdown of Sub-1nm EOT HfO2/Metal Gate Stacks
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Comprehensive Understanding of PBTI and NBTI Reliability of High-K / Metal Gate Stacks With EOT Scaling to Sub-1nm
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Degradation of Polycrystalline HfO2-based Gate Dielectrics Under Nanoscale Electrical Stress
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Metal-Gate-Induced Reduction of the Interfacial Layer in Hf Oxide Gate Stacks
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Dielectric Properties of Er−doped HfO2 (Er∼15%) Grown by Atomic Layer Deposition for High-Κ Gate Stacks
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Sub-1nm Patterning Accuracy via Spatial-Phase Locking