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Publications by Takaaki DOI

Measurement of Thermal Radiative Properties of Silicon Wafers With Oxide Film and Nitride Film at 950°C

JSME international journal. Ser. 2, Fluids engineering, heat transfer, power, combustion, thermophysical properties

English

Related publications

Characteristics of Polycrystalline Silicon Thin-Film Transistors With Thin Oxide/Nitride Gate Structures

Optical Engineering

Molecular Physics,

English

Nonvolatile Polycrystalline Silicon Thin-Film-Transistor Memory With Oxide/Nitride/Oxide Stack Gate Dielectrics and Nanowire Channels

Applied Physics Letters

English

Hydrothermal Formation and Properties of Chromium Oxide Film.

Review of High Pressure Science and Technology/Koatsuryoku No Kagaku To Gijutsu

Materials Science

Condensed Matter Physics

English

Effect of Thermal History on Pyrolysis of Si-C-O Amorphous Fiber Coated With Oxide Film

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Mechanics of Materials

Materials Chemistry

Condensed Matter Physics

English

Properties of Silicon Dioxide Film Deposited by PECVD at Low Temperature/Pressure

Metallurgical and Materials Engineering

Mechanical Engineering

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Thermal Conductivity and Specific Heat of Thin-Film Amorphous Silicon

Physical Review Letters

English

Comparison of Silicon Oxide and Silicon Carbide Absorber Materials in Silicon Thin-Film Solar Cells

EPJ Photovoltaics

Electronic Engineering

Condensed Matter Physics

Renewable Energy

Magnetic Materials

the Environment

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Hydrophilic Silicon Oxide Film by Pulsed Plasma CVD

English

Tunable Hybrid Silicon Nitride and Thin-Film Lithium Niobate Electro-Optic Microresonator

Molecular Physics,

English