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Publications by Takahiro Kozawa
Study on Resist Performance of Chemically Amplified Molecular Resists Based on Cyclic Oligomers
Microelectronic Engineering
Surfaces
Electronic Engineering
Condensed Matter Physics
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Films
Nanotechnology
Optics
Coatings
Dynamics of Radical Cations of Poly(4-Hydroxystyrene) in the Presence and Absence of Triphenylsulfonium Triflate as Determined by Pulse Radiolysis of Its Highly Concentrated Solution
Chemical Physics Letters
Theoretical Chemistry
Astronomy
Physics
Physical
Determination of Optimum Thermalization Distance Based on Trade-Off Relationship Between Resolution, Line Edge Roughness and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Controlled Array of Gold Nanoparticles by Combination of Nano Imprint and Self-Assembly
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Correlation Between Grinding Results in a Tumbling Ball Mill With Liquid Media and the Distribution of Ball Impact Energy Calculated by DEM Simulation
Journal of the Society of Powder Technology, Japan
Filtration
Fluid Flow
Process Chemistry
Separation
Transfer Processes
Catalysis
Technology
Basic Aspects of Acid Generation Processes in Chemically Amplified Electron Beam Resist
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics