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Publications by Takashi Sekito
Extension of 193nm Lithography by Chemical Shrink Process
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Contact Hole Shrink Process Using Graphoepitaxial Directed Self-Assembly Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
Quantitative Pattern Collapse Metrology for 193nm Immersion Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Lithography-Free Fabrication of Silicon Nanowire and Nanohole Arrays by Metal-Assisted Chemical Etching
Nanoscale Research Letters
Materials Science
Nanotechnology
Condensed Matter Physics
Nanoscience
Innovative Process and Material for Sub-80nm Lithography (M+Process)
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Patterning of Supported Gold Monolayers via Chemical Lift-Off Lithography
Beilstein Journal of Nanotechnology
Electronic Engineering
Materials Science
Nanoscience
Electrical
Nanotechnology
Astronomy
Physics
Calculation of the Crystallization Process Complicated by Chemical Reaction
Vestnik Tambovskogo gosudarstvennogo tehnicheskogo universiteta
Genomes on the Shrink
Proceedings of the National Academy of Sciences of the United States of America
Multidisciplinary
193nm Generation by Optical Frequency Conversion Using CsLiB6O10 Crystal (CLBO).
The Review of Laser Engineering
Diffusion Kinetic of Vapor-Phase Silylation Process for ArF Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
