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Publications by Takeshi Kadono
Fundamental Characteristics of Cyanide‐Related Multielement Molecular Ion‐Implanted Epitaxial Si Wafers for High‐Performance CMOS Image Sensors
Physica Status Solidi (A) Applications and Materials Science
Surfaces
Electronic Engineering
Condensed Matter Physics
Materials Chemistry
Optical
Electrical
Magnetic Materials
Films
Coatings
Electronic
Interfaces
Molecular and Atomic Hydrogen Diffusion Behavior by Reaction Kinetic Analysis in Projection Range of Hydrocarbon Molecular Ion for CMOS Image Sensors
Physica Status Solidi (A) Applications and Materials Science
Surfaces
Electronic Engineering
Condensed Matter Physics
Materials Chemistry
Optical
Electrical
Magnetic Materials
Films
Coatings
Electronic
Interfaces
Related publications
Modelling of High Dynamic Range Logarithmic CMOS Image Sensors
Range-Scaled 14b 30 MS/s Pipeline-Sar Composite ADC for High-Performance CMOS Image Sensors
Journal of Semiconductor Technology and Science
Electronic Engineering
Optical
Electrical
Magnetic Materials
Electronic
Advances on CMOS Image Sensors
Sensor Review
Electronic Engineering
Industrial
Electrical
Manufacturing Engineering
Radiation Hard Pixel Sensors Using High-Resistive Wafers in a 150 Nm CMOS Processing Line
Journal of Instrumentation
Instrumentation
Mathematical Physics
Timing Generator for 120fps CMOS Image Sensors on 0.13 Μm CMOS Technology
MeV Electron Irradiation of Ion-Implanted Si-SiO2 Structures
A High-Efficiency Low-Cost Wire-Bond Loop Antenna for CMOS Wafers
AP-S International Symposium (Digest) (IEEE Antennas and Propagation Society)
Electronic Engineering
Electrical
Characteristics of Gettering Process in Multicrystalline Si Wafers With Combined Porous Si/Al Getters
Semiconductor Physics, Quantum Electronics and Optoelectronics
Electronic Engineering
Optics
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Electronic
