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Publications by Takuya Ohashi
Deformation Analysis of ArF Resist Pattern by Using AFM
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Cohesion Property of Resist Micro Pattern Analyzed by Using Atomic Force Microscope (AFM)
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Implementation of ArF Resist Processes for 130nm and Below.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Highly-Efficient Photoacid Generators for ArF Resist.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
In Situ Analysis of the EUV Resist Pattern Formation During the Resist Dissolution Process
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Design of Novel ArF Negative Resist System for Phase-Shifting Lithography Using Androsterone Structure With .DELTA.-Hydroxy Acid.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
DUV Hardened Layer of Resist Dot Pattern Detected by Tip Indentation Method.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Image Analysis and Length Estimation of Biomolecules Using AFM
IEEE Transactions on Information Technology in Biomedicine
