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Publications by Thomas R. Arend
Physical Vapor Deposition of Methylammonium Tin Iodide Thin Films
Physica Status Solidi (A) Applications and Materials Science
Surfaces
Electronic Engineering
Condensed Matter Physics
Materials Chemistry
Optical
Electrical
Magnetic Materials
Films
Coatings
Electronic
Interfaces
Related publications
One-Amide Thin Films Prepared by Physical Vapor Deposition of Nylon6 Granules
Experimental and Theoretical Validation of Ga2O3 Thin Films Deposited by Physical Vapor Deposition
Spray Pyrolysis Deposition of Nanostructured Tin Oxide Thin Films
ISRN Nanotechnology
Organometallic Chemical Vapor Deposition of Copper Oxide Thin Films
Optical Properties of Wide Band Gap Indium Sulphide Thin Films Obtained by Physical Vapor Deposition
physica status solidi (a)
Utilization of Water Vapor for Sputter Deposition of Thin Films
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
High Temperature Dielectric Properties of (BxNyOz) Thin Films Deposited Using Ion Source Assisted Physical Vapor Deposition
Journal of Advanced Dielectrics
Electronic Engineering
Condensed Matter Physics
Optical
Electrical
Magnetic Materials
Composites
Electronic
Ceramics
Grid-Assisted Magnetron Sputtering Deposition of Nitrogen Graded TiN Thin Films
SN Applied Sciences
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
