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Publications by Tomoyuki Mizukoshi
Effects of Preparation Conditions on Chemical Composition and Hardness of Titanium Nitride Films Prepared by Reactive HCD Ion Plating
Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of Materials
Alloys
Materials Chemistry
Condensed Matter Physics
Metals
Related publications
Preparation of Titanium Nitride Films by Plasma-Enhanced Chemical Vapor Deposition (II)
SHINKU
Corrosion Behavior of Chromium Nitride Films Produced by Reactive Ion Plating in Sulfuric Acid Solution
Materials Transactions, JIM
Corrosion Behaviour of Titanium Nitride Produced by High Temperature Nitriding and Reactive Ion Plating in Sulfuric Acid Solution
Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of Materials
Alloys
Materials Chemistry
Condensed Matter Physics
Metals
Preparation of Fullerene Thin Films by Ion Plating and Transmittance Analysis
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Ultra Thin TiN Films Prepared by an Advanced Ion-Plating Method
Materials Transactions, JIM
Effects of Additive Elements on Magnetic Properties of Iron Nitride Thin Films Prepared by Ion Assisted Vapor Deposition.
Journal of the Magnetics Society of Japan
Preparation of Alumina Films by Ion Plating Using Pulse Bias DC Source.
SHINKU
Effects of Substrate Bias Voltages on Hardness of BCN Films Prepared by RF Magnetron Sputtering
Transactions of the Materials Research Society of Japan
Preparation of Boron Nitride Thin Films by Using Plasma Chemical Transport of Boron.
Journal of the Surface Finishing Society of Japan
