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Publications by Toshihiro ANDO
Effects of Hydrogen Sulfide on the Plasma-Assisted Chemical Vapor Deposition of Carbon Nanotubes.
Hyomen Kagaku
Development of Seismic Retrofitting Method of Rc Columns With Thin Steel Sheets Glued Around and Heaped
Doboku Gakkai Ronbunshuu F
Related publications
Growth of Aligned Carbon Nanotubes on Carbon Microfibers by Dc Plasma-Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Characteristics of Diamond-Like Carbon Coating Using Plasma Assisted Chemical Vapor Deposition on Steel Tool
Automotive Experiences
Growth of Carbon Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition at Low Temperature
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Gallium Assisted Plasma Enhanced Chemical Vapor Deposition of Silicon Nanowires
Nanotechnology
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
Materials Science
Nanoscience
Electrical
Bioengineering
Nanotechnology
Chemistry
Hot Wire Chemical Vapor Deposition of Isolated Carbon Single-Walled Nanotubes
Applied Physics Letters
Astronomy
Physics
A High Temperature, Plasma-Assisted Chemical Vapor Deposition System
Forming Silicon Carbon Nitride Crystals and Silicon Carbon Nitride Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Plasmon-Assisted Chemical Vapor Deposition
Preparation of Thin Dielectric Films by Plasma-Assisted Chemical Vapor Deposition of Hexamethyldisilazane.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
