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Publications by Toshikazu Nishide

Characterization of Sol-Gel-Derived and Crystallized HfO2, ZrO2, ZrO2-Y2O3 Thin Films on Si(001) Wafers With High Dielectric Constant

English

Related publications

Microwave Characterization of (Pb,La)TiO3 Thin Films Integrated on ZrO2∕SiO2∕Si Wafers by Sol-Gel Techniques

Applied Physics Letters

English

Preparation of ZrO2-Y2O3 Thin Films by the Sol-Gel Method

NIPPON KAGAKU KAISHI

English

Characterization of Thin ZrO2 Films Deposited Using (ZrOi–Pr)2(thd)2 and O2 on Si(100)

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Aqueous Solution–gel Preparation of Ultrathin ZrO2 Films for Gate Dielectric Application

Thin Solid Films

Materials Chemistry

Magnetic Materials

English

Self-Organized ZrO2 Dendrites by Sol-Gel Process

Microscopy and Microanalysis

Instrumentation

English

Electron Microscopy of Thin-Film Y2o3-Stabilized ZrO2 and CeO2 on MgO

Microscopy and Microanalysis

Instrumentation

English

Interdiffusion Studies on High-Tc Superconducting YBa2Cu3O7−δ Thin Films on Si(111) With a NiSi2/ZrO2 Buffer Layer

Applied Surface Science

Condensed Matter Physics

English

Resistive Switching Characteristics of HfO2 Thin Films on Mica Substrates Prepared by Sol-Gel Process

Materials Science

Chemical Engineering

English

Interfacial Compound Suppression and Dielectric Properties Enhancement of F–N Codoped ZrO2 Thin Films

Applied Physics Letters

English