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Publications by Toshiro Itani
Alternative Developer Solutions and Processes for EUV and ArFi Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
In Situ Analysis of the EUV Resist Pattern Formation During the Resist Dissolution Process
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Extreme Ultraviolet (EUV)-Resist Material Based on Noria (Water Wheel-Like Macrocycle ) Derivatives With Pendant Alkoxyl and Adamantyl Ester Groups
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Activation Energies for Deprotection Reaction of Chemically Amplified Resists: A Study Using In-Situ FT-IR Spectroscopy.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
A Study of an Organic Bottom Antireflective Coating for 157-Nm Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
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