Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by Toshiyuki UCHINO
Measurement of Thermal Radiative Properties of Silicon Wafers With Oxide Film and Nitride Film at 950°C
JSME international journal. Ser. 2, Fluids engineering, heat transfer, power, combustion, thermophysical properties
Related publications
Characteristics of Polycrystalline Silicon Thin-Film Transistors With Thin Oxide/Nitride Gate Structures
Optical Engineering
Engineering
Optics
Atomic
Molecular Physics,
Nonvolatile Polycrystalline Silicon Thin-Film-Transistor Memory With Oxide/Nitride/Oxide Stack Gate Dielectrics and Nanowire Channels
Applied Physics Letters
Astronomy
Physics
Hydrothermal Formation and Properties of Chromium Oxide Film.
Review of High Pressure Science and Technology/Koatsuryoku No Kagaku To Gijutsu
Materials Science
Chemistry
Condensed Matter Physics
Effect of Thermal History on Pyrolysis of Si-C-O Amorphous Fiber Coated With Oxide Film
Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of Materials
Alloys
Materials Chemistry
Condensed Matter Physics
Metals
Properties of Silicon Dioxide Film Deposited by PECVD at Low Temperature/Pressure
Metallurgical and Materials Engineering
Alloys
Metals
Mechanical Engineering
Thermal Conductivity and Specific Heat of Thin-Film Amorphous Silicon
Physical Review Letters
Astronomy
Physics
Comparison of Silicon Oxide and Silicon Carbide Absorber Materials in Silicon Thin-Film Solar Cells
EPJ Photovoltaics
Electronic Engineering
Condensed Matter Physics
Renewable Energy
Sustainability
Optical
Electrical
Magnetic Materials
Electronic
the Environment
Hydrophilic Silicon Oxide Film by Pulsed Plasma CVD
Shinku
Tunable Hybrid Silicon Nitride and Thin-Film Lithium Niobate Electro-Optic Microresonator
Optics Letters
Optics
Atomic
Molecular Physics,