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Publications by U. Meier
Atomic Hydrogen Concentration Profiles at Filaments Used for Chemical Vapor Deposition of Diamond
Applied Physics Letters
Astronomy
Physics
Related publications
Radio‐frequency Plasma Chemical Vapor Deposition Growth of Diamond
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Stress Evolution in Nanocrystalline Diamond Films Produced by Chemical Vapor Deposition
Journal of Applied Physics
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Space Filling by Nucleation and Growth in Chemical Vapor Deposition of Diamond
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Condensed Matter Physics
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Tribological Properties of Nanocrystalline Diamond Films Deposited by Hot Filament Chemical Vapor Deposition
AIP Advances
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Chemical Vapor Deposition of Diamond on Si Substrate Treated by Using Fluidized Bed.
Kagaku Kogaku Ronbunshu
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Effects of Laser Photolysis of Hydrocarbons at 193 and 248 Nm on Chemical Vapor Deposition of Diamond Films
Electron‐emission‐enhanced Diamond Nucleation on Si by Hot Filament Chemical Vapor Deposition
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Chemical Vapor Deposition Model of Polysilicon in a Trichlorosilane and Hydrogen System
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Growth of Diamond Thin Films by Electron Assisted and DC Plasma Chemical Vapor Deposition.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
