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Publications by W. Rockward

Interferometric Lithography With an Amplitude Division Interferometer and a Desktop Extreme Ultraviolet Laser

Journal of the Optical Society of America B: Optical Physics
Nonlinear PhysicsOpticsAtomicStatisticalMolecular Physics,
2008English

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Enhancing Extreme Ultraviolet Photons Emission in Laser Produced Plasmas for Advanced Lithography

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Power Scaling of an Extreme Ultraviolet Light Source for Future Lithography

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Interferometric At-Wavelength Flare Characterization of Extreme Ultraviolet Optical Systems

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Pushing Extreme Ultraviolet Lithography Development Beyond 22 Nm Half Pitch

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Intense Plasma Discharge Source at 135 Nm for Extreme-Ultraviolet Lithography

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Experimental Investigation of Beryllium-Based Multilayer Coatings for Extreme Ultraviolet Lithography

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