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Publications by W. Schoenmaker

Measurement and Simulation of Boron Diffusivity in Strained Si1–xGexEpitaxial Layers

Electronic Engineering

Computer Graphics

Computer-Aided Design

English

Related publications

Improved Hole Mobilities and Thermal Stability in a Strained‐Si∕strained‐Si1−yGey∕strained‐Si Heterostructure Grown on a Relaxed Si1−xGex Buffer

Applied Physics Letters

English

Monte Carlo Simulation of Non-Local Transport Effects in Strained Si on Relaxed Si1 – xGexHeterostructures

Electronic Engineering

Computer Graphics

Computer-Aided Design

English

Alloy Scattering Limited Transport of Two‐dimensional Carriers in Strained Si1−xGexquantum Wells

Applied Physics Letters

English

Composition and Strain Contrast of Si1−xGex (X=0.20) and Si1−yCy (Y≤0.015) Epitaxial Strained Films on (100) Si in Annular Dark Field Images

Journal of Applied Physics

English

Apparent Depression of Boron Diffusivity in Doped Oxide-Si System

Denki Kagaku oyobi Kogyo Butsuri Kagaku

English

Amorphization Threshold in Si-Implanted Strained Sige Alloy Layers

Materials Research Society Symposium - Proceedings

Mechanics of Materials

Materials Science

Condensed Matter Physics

Mechanical Engineering

English

Comparison of Interfacial and Electrical Characteristics of HfO2 and HfAlO High-K Dielectrics on Compressively Strained Si1−xGex

Applied Physics Letters

English

The Role of Unequal Diffusivities in Ignition and Extinction Fronts in Strained Mixing Layers

Combustion Theory and Modelling

Energy Engineering

Fuel Technology

Chemical Engineering

Power Technology

English

Control of Sn Precipitation and Strain Relaxation in Compositionally Step-Graded Ge1-xSnxBuffer Layers for Tensile-Strained Ge Layers

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

English