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Publications by William R. Harrell
Effects of Slow Highly Charged Ion Irradiation on Metal Oxide Semiconductor Capacitors
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
Related publications
Surface Treatments on the Characteristics of Metal–Oxide Semiconductor Capacitors
Crystals
Materials Science
Inorganic Chemistry
Chemical Engineering
Condensed Matter Physics
Electron Beam Irradiation Effects in Thick-Oxide MOS Capacitors
IEEE Transactions on Nuclear Science
Electronic Engineering
Nuclear
Nuclear Energy
High Energy Physics
Engineering
Electrical
Effects of Slow Highly Charged Ion Impact Upon Highly Oriented Pyrolytic Graphite-Nanoscale Modification of Electronic States of Graphite Surface-
IEEJ Transactions on Electronics, Information and Systems
Electronic Engineering
Electrical
Annealing Condition Optimization and Electrical Characterization of Amorphous LaAlO3∕GaAs Metal-Oxide-Semiconductor Capacitors
Applied Physics Letters
Astronomy
Physics
System of Slow Highly Charged Ion Beam Generation Using a Cold Positron Plasma Trap at RIKEN
AIP Conference Proceedings
Astronomy
Physics
CMOS (Complementary Metal-Oxide-Semiconductor)
Influence of Transition Metal Nickel on Semiconductor Tin Oxide
International Journal of Advance Engineering and Research Development
Flexible, All Metal-Oxide Capacitors for Printed Electronics
Methods of Failure Diagnostics of Tantalum Oxide-Semiconductor Capacitors With Solid Dielectric
Innovative Technologies and Scientific Solutions for Industries
