Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by Y.-C. Fu
(Invited) Towards a Vertical and Damage Free Post-Etch InGaAs Fin Profile: Dry Etch Processing, Sidewall Damage Assessment and Mitigation Options
ECS Transactions
Engineering
Related publications
A Study of Parameters Related to the Etch Rate for a Dry Etch Process Using NF3/O2and SF6/O2
Advances in Materials Science and Engineering
Materials Science
Engineering
Preface: Damage of Natural Hazards: Assessment and Mitigation
Natural Hazards and Earth System Sciences
Earth
Planetary Sciences
Investigation of “Fur-Like” Residues Post Dry Etching of Polyimide Using Aluminum Hard Etch Mask
Materials Science in Semiconductor Processing
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Dry Etch Characteristics of Silylated Deep UV Resists in Novel Plasma Configurations.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Reduction of Critical Dimension Difference in Litho-Etch-Litho- Etch Double Patterning Process
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Ex Post Damage Assessment: An Italian Experience
Natural Hazards and Earth System Sciences
Earth
Planetary Sciences
Optimum Fin Profile Under Dry and Wet Surface Conditions
Extremely High Selective Etching of Porous Si for Single Etch-Stop Bond-And-Etch-Back SOI
Invited Review: Abomasal Damage in Veal Calves
Journal of Dairy Science
Animal Science
Zoology
Genetics
Food Science