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Publications by Yamile Wasslen
Iminopyrrolidine Ligand Design and Novel Group Four Precursors for Chemical Vapour and Atomic Layer Deposition
Related publications
Thin Film Precursors, Properties and Applications: Chemical Vapour Deposition and Atomic Layer Deposition of Group 4, 11 and 13 Elements and Their Oxides
Group 11 Precursors for Atomic Layer Deposition: Design and Synthesis of Advanced Precursors Enabled by Investigations in Thermolysis
Surface Chemistry and Development of Group 11 and 13 Thin Film Vapour Deposition Precursors
Design and Fabrication of a Chemical Vapour Deposition System With Special Reference to ZrC Layer Growth Characteristics
Journal of the Southern African Institute of Mining and Metallurgy
Rational Design of a Binary Metal Alloy for Chemical Vapour Deposition Growth of Uniform Single-Layer Graphene
Nature Communications
Astronomy
Genetics
Molecular Biology
Biochemistry
Chemistry
Physics
The Aerosol Assisted Chemical Vapour Deposition of SnSe and Cu2SnSe3 Thin Films From Molecular Precursors
Chemical Communications
Surfaces
Alloys
Materials Chemistry
Coatings
Metals
Optical
Magnetic Materials
Films
Catalysis
Chemistry
Electronic
Composites
Ceramics
Atomic Layer Deposition for Energy and Environmental Applications
Advanced Materials Interfaces
Mechanics of Materials
Mechanical Engineering
Nonfluorinated Volatile Copper(I) 1, 3-Diketiminates as Precursors for Cu Metal Deposition via Atomic Layer Deposition
Design of an Atomic Layer Deposition Reactor for Hydrogen Sulfide Compatibility
Review of Scientific Instruments
Medicine
Instrumentation
