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Publications by Yanzhen Wang
Optimization of Fluorine Plasma Treatment for Interface Improvement on HfO2/In0.53Ga0.47As MOSFETs
Applied Sciences (Switzerland)
Instrumentation
Materials Science
Fluid Flow
Engineering
Computer Science Applications
Process Chemistry
Transfer Processes
Technology
Related publications
Influence of Plasma-Based In-Situ Surface Cleaning Procedures on HfO2/In0.53Ga0.47As Gate Stack Properties
Journal of Applied Physics
Astronomy
Physics
In0.53Ga0.47As Channel N-MOSFETs With Shallow Metallic S/D Extension
Interface Effect on Dielectric Constant of HfO2∕Al2O3 Nanolaminate Films Deposited by Plasma-Enhanced Atomic Layer Deposition
Applied Physics Letters
Astronomy
Physics
Correction: Interface-Engineered Reliable HfO2-based RRAM for Synaptic Simulation
Journal of Materials Chemistry C
Materials Chemistry
Chemistry
Sulfur Passivation Effect on HfO2/GaAs Interface: A First-Principles Study
Applied Physics Letters
Astronomy
Physics
Optimization of the Cell Structure for Radiation-Hardened Power MOSFETs
Electronics (Switzerland)
Control
Electronic Engineering
Signal Processing
Computer Networks
Systems Engineering
Hardware
Communications
Electrical
Architecture
Modeling of High-Voltage MOSFETs for Device/Circuit Optimization (Invited)
Revision of Interface Coupling in Ultra-Thin Body Silicon-On-Insulator MOSFETs
Semiconductor Physics, Quantum Electronics and Optoelectronics
Electronic Engineering
Optics
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Electronic
Plasma Treatment of Dentin Surfaces for Improving Self-Etching Adhesive/Dentin Interface Bonding
Clinical Plasma Medicine
Dermatology
Surgery
Alternative Medicine
Complementary
