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Publications by Yasumasa Toyoshima
Remotely Induced High-Density Hollow-Anode Plasma and Its Application to Fast Deposition of Photosensitive Microcrystalline Silicon Thin Film With Preferential Orientation
AIP Advances
Nanotechnology
Astronomy
Physics
Nanoscience
Related publications
Proton-Induced Degradation of Thin-Film Microcrystalline Silicon Solar Cells
Journal of Non-Crystalline Solids
Condensed Matter Physics
Materials Chemistry
Optical
Magnetic Materials
Composites
Electronic
Ceramics
Microcrystalline Silicon Thin-Film Transistors Operating at Very High Frequencies
Applied Physics Letters
Astronomy
Physics
Evaluation of Nanopulse Plasma and Its Application to DLC Film Deposition
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Post-Deposition Catalytic-Doping of Microcrystalline Silicon Thin Layer for Application in Silicon Heterojunction Solar Cell
Thin Solid Films
Surfaces
Alloys
Optical
Interfaces
Metals
Materials Chemistry
Magnetic Materials
Films
Coatings
Electronic
Micro Raman Spectroscopy Analysis of Doped Amorphous and Microcrystalline Silicon Thin Film Layers and Its Application in Heterojunction Silicon Wafer Solar Cells
Transactions of the Materials Research Society of Japan
Generation of High-Purity Ozone Beam and Its Application to the Formation of Ultra-Thin Silicon Dioxide Film.
Hyomen Kagaku
Low-Temperature Deposition of Silicon Dioxide Films in High-Density Plasma
Semiconductor Physics, Quantum Electronics and Optoelectronics
Electronic Engineering
Optics
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Electronic
High Speed Lateral Crystallization of Amorphous Silicon Films on Glass Substrates by Micro-Thermal-Plasma-Jet Irradiation and Its Application to Thin Film Transistor Fabrication
Key Technologies for Next Generation Thin Film Silicon Solar Cells. Issues Upon Surface and Interface of Microcrystalline Silicon Thin Film as a Solar Cell Material.
Hyomen Kagaku
