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Publications by Yasuo SUZUOKI
Structure and Electrical Properties of Hydrogenated Amorphous Silicon Carbide Prepared by Plasma CVD Method.
Journal of Society of Materials Engineering for Resources of Japan
Related publications
Impact of Dilution Gases on Structure, Properties and Growth of Hydrogenated Nanocrystalline Silicon (Nc-Si:H) Prepared by HW-CVD Method
International Journal of Thin Film Science and Technology
Mechanics of Materials
Surfaces
Interfaces
Coatings
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Optical Properties of Hydrogenated Amorphous Silicon
Journal of Applied Physics
Astronomy
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A Study of Electronic Defects in Hydrogenated Amorphous Silicon Prepared by the Expanding Thermal Plasma Technique
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
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Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method
Journal of Coatings
Structural and Electrical Properties of Silicon Nitride Films Prepared by Multipolar Plasma‐enhanced Deposition
Journal of Applied Physics
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Top-Gate Amorphous-Silicon Thin-Film Transistors Produced by CVD Method
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
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Optical and Electrical Properties of Amorphous SiC:H Prepared by Magnetron Sputtering.
SHINKU
Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide
International Journal of Photoenergy
Materials Science
Renewable Energy
Molecular Physics,
Sustainability
Atomic
Chemistry
Optics
the Environment
Nonlinear Transmission Properties of Hydrogenated Amorphous Silicon Core Optical Fibers
Optics Express
Optics
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Molecular Physics,
