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Publications by Yasushi MORIIZUMI
Optical and Mechanical Properties of SiO2 and Nb2O5 Thin Films Deposited by High-Density Plasma Assisted Vapor Deposition
Journal of The Surface Finishing Society of Japan
Related publications
High Temperature Dielectric Properties of (BxNyOz) Thin Films Deposited Using Ion Source Assisted Physical Vapor Deposition
Journal of Advanced Dielectrics
Electronic Engineering
Condensed Matter Physics
Optical
Electrical
Magnetic Materials
Composites
Electronic
Ceramics
Mechanical Properties of B(C,N) Thin Film by Plasma-Assisted Chemical Vapor Deposition.
SHINKU
Growth of Diamond Thin Films by Electron Assisted and DC Plasma Chemical Vapor Deposition.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Preparation of Thin Dielectric Films by Plasma-Assisted Chemical Vapor Deposition of Hexamethyldisilazane.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition
Journal of Applied Sciences
Experimental and Theoretical Validation of Ga2O3 Thin Films Deposited by Physical Vapor Deposition
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Electrochromic and Colorimetric Properties of Nickel(II) Oxide Thin Films Prepared by Aerosol-Assisted Chemical Vapor Deposition
ACS Applied Materials & Interfaces
Medicine
Materials Science
Nanotechnology
Nanoscience
Electrical and Mechanical Properties of Si-B-N Films Made by Plasma-Enhanced Chemical Vapor Deposition.
Transactions of the Japan Society of Mechanical Engineers Series A