Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by Yongfa Fan
ILSim: A Compact Simulation Tool for Interferometric Lithography
Approaching the Numerical Aperture of Water Immersion Lithography at 193-Nm
Related publications
Compact Synchrotron Radiation Source AURORA for X-Ray Lithography.
SHINKU
Bootstrap Resampling as a Tool for Radio Interferometric Imaging Fidelity Assessment
Astronomical Journal
Astrophysics
Astronomy
Planetary Science
Space
EUV Lithography and Exposure Tool.
Journal of Plasma and Fusion Research
Development of a Simple, Compact, Low-Cost Interference Lithography System
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
Interferometric Lithography With an Amplitude Division Interferometer and a Desktop Extreme Ultraviolet Laser
Journal of the Optical Society of America B: Optical Physics
Nonlinear Physics
Optics
Atomic
Statistical
Molecular Physics,
Use of Interferometric Lithography to Characterize the Spatial Resolution of a Photoresist Film
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Approach to EUV Lithography Simulation
Distributed Simulation for a Modeling and Simulation Tool: Papyrus
Laser-Produced X-Rays for Compact X-Ray Lithography and Microscopy
SPIE Newsroom
