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Publications by Yoshisada EBATA

Evaluation of Optical Characteristics in Deep Ultraviolet Region. Measurement of Optical Elements Used for Excimer Laser Lithography.

Journal of the Spectroscopical Society of Japan

English

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Characteristics of Photomask Substrate in Optical Lithography

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O-Nitrobenzyl Ester Based Deep UV Resist for KrF Excimer Laser Lithography

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Development of Lithography Based on Excimer Laser.

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Two Novel Nonlinear Optical Carbonates in the Deep-Ultraviolet Region: KBeCO3F and RbAlCO3F2

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Temperature Measurement in Plasmonic Nanoapertures Used for Optical Trapping

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Diffractive Optical Elements for CO2 Laser Beam Diagnostics

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Optical Materials for Immersion Lithography

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Optical Properties of Sodium Nitrate in the Vacuum Ultraviolet Region

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Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

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