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Publications in Polymers

Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Magnetic Field and Polymer Matrix Effects on Photochemical Reactions of Hexaarylbiimidazole in Solid Polymer Matrices.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Properties of Asymmetric BPDA Based Phenylethynyl Terminated Thermosetting Polyimide and Its Composite

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Chemical Amplification Resists: Laboratory Curiosity to Paradigm

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Plasma Polymerization of Heteroaromatic Compounds.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

193 Nm Resist Line Collapse Study by Modifying the Resist Polymer and Process Conditions With Utilizing FIRM Process

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Block Copolymers as Lithographic Materials.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

The Lithographic Performance and Contamination Resistance of a New Family of Chemically Amplified DUV Photoresists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Dissociative Excitation of Some Gaseous Organosilicon Compounds by Electron Impact.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Preparation of Polyacenic Semiconductor (PAS) Thin Films by Excimer Laser Ablation of Bulky PAS Materials.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English