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Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1994English

Critique Bibliographique Et Construction Disciplinaire : l'Invention d'Un Savoir-Faire

Geneses
Public AdministrationSociologyCultural StudiesPolitical ScienceHistory
1994English

Erratum

Argumentation
LinguisticsPhilosophyLanguage
1994English

Television, Culture and State: New Forums for Negotiating Identity in the Pacific

Continuum
Visual ArtsPerforming ArtsCultural Studies
1994English

The Lithographic Performance and Contamination Resistance of a New Family of Chemically Amplified DUV Photoresists.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1994English

Code Scheduling for Multiple Instruction Stream Architectures

International Journal of Parallel Programming
Theoretical Computer ScienceInformation SystemsSoftware
1994English

The Other Proletarians: Seasonal Labourers, Mercenaries and Miners

International Review of Social History
Social SciencesHistory
1994English

Electron Beam Lithography Using GaAs Oxidized Resist for GaAs/AlGaAs Ultrafine Structure Fabrication.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1994English

Surface Observation of Phase Separated Polymeric Lb Films Using Scanning Probe Microscopy.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1994English

Photo-Optical Effect of Polymers Containing Norbornadiene Moieties.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1994English

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