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Structure and Electrical Properties of Hydrogenated Amorphous Silicon Carbide Prepared by Plasma CVD Method.
Journal of Society of Materials Engineering for Resources of Japan
Mechanical Properties of B(C,N) Thin Film by Plasma-Assisted Chemical Vapor Deposition.
SHINKU
Metabolic Heterogeneity Associated With High Plasma Triglyceride or Low HDL Cholesterol Levels in Men
Arteriosclerosis and Thrombosis: A Journal of Vascular Biology
Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching
Electrochemical and Solid-State Letters
Significance of Thrombus Formation and Infiltration of Plasma Proteins as Initiating Factors in Atherogenesis
The Journal of Japan Atherosclerosis Society
Investigations Into the Presence of a Competitive Inhibitor (Preprothrombin) in the Plasma of Chicks.
Acta Chemica Scandinavica
Investigation of the Transmission and Stopping of Light Ions Passing Through a Plasma Target
Le Journal de Physique Colloques
Latest Situation and Problems of Low-Temperature Plasma Processing Equipment for Semi-Conductor Materials
Sen'i Kikai Gakkaishi (Journal of the Textile Machinery Society of Japan)
Activity of Platelet-Activating Factor (PAF) Acetylhydrolase in Plasma of Patiens With Cerebral Thrombosis
Nosotchu
Transport Theory of the Quark-Gluon Plasma Based on an Operator-Field Langevin Equation
Physical Review D
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