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Atomic Layer Deposition of High Quality HfO2 Using In-Situ Formed Hydrophilic Oxide as an Interfacial Layer
ECS Journal of Solid State Science and Technology
- United States
doi 10.1149/2.0041412jss
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Categories
Optical
Electronic
Magnetic Materials
Date
January 1, 2014
Authors
Lei Han
Jie Pan
Qinglin Zhang
Shibin Li
Zhi Chen
Publisher
The Electrochemical Society
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