Characterization of a Liquid-Xenon-Jet Laser-Plasma Extreme-Ultraviolet Source

Review of Scientific Instruments - United States
doi 10.1063/1.1755441
Full Text
Abstract

Available in full text

Date
Authors
Publisher

AIP Publishing

Related search

Improved Emission Uniformity From a Liquid-Jet Laser-Plasma Extreme-Ultraviolet Source

Applied Optics
2004English

Short-Pulse, Extreme-Ultraviolet Continuum Emission From a Table-Top Laser Plasma Light Source

Applied Physics Letters
AstronomyPhysics
1997English

Characteristics of Extreme Ultraviolet Emission From CO2 Laser-Produced Plasma

IEEJ Transactions on Electronics, Information and Systems
Electronic EngineeringElectrical
2007English

Intense Plasma Discharge Source at 135 Nm for Extreme-Ultraviolet Lithography

Optics Letters
OpticsAtomicMolecular Physics,
1997English

Extreme-Ultraviolet Vortices From a Free-Electron Laser

Physical Review X
AstronomyPhysics
2017English

Spectroscopic Study of Debris Mitigation With Minimum-Mass Sn Laser Plasma for Extreme Ultraviolet Lithography

Applied Physics Letters
AstronomyPhysics
2006English

X-Ray Emission of a Xenon Gas Jet Plasma Diagnosed With Thomson Scattering

Physical Review E
2002English

Generation of High-Flux Attosecond Extreme Ultraviolet Continuum With a 10 TW Laser

Applied Physics Letters
AstronomyPhysics
2013English

Power Scaling of an Extreme Ultraviolet Light Source for Future Lithography

Applied Physics Letters
AstronomyPhysics
2008English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy