CoCrPtTa/Ti Perpendicular Media Deposited at High Sputtering Rate

IEEE Transactions on Magnetics - United States
doi 10.1109/20.950829
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Related search

High-Coercivity CoCrPt-Ti Perpendicular Media by in Situ Interdiffusion of CrMn Ultrathin Overlayers

IEEE Transactions on Magnetics
Electronic EngineeringOpticalElectricalMagnetic MaterialsElectronic
2002English

Investigation of Structural, Optical and Electrical Properties of (Ti,Nb)Ox Thin Films Deposited by High Energy Reactive Magnetron Sputtering

Materials Science-Poland
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2014English

Analysis of GaAs-Ti Thin Films Deposited by Sputtering Onto C-Si and GaAs

2009English

Alloy Sputtering at High Fluence: Preferential Sputtering and Competing Effects

1992English

Hydrogenated Amorphous Silicon Deposited by High Pressure Sputtering for HIT Solar Cells

2013English

Tribological Behavior of Ti-Al-Si-C-N Hard Coatings Deposited by Hybrid Arc-Enhanced Magnetron Sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2012English

Hydrogen-Doped High Conductivity ZnO Films Deposited by Radio-Frequency Magnetron Sputtering

Applied Physics Letters
AstronomyPhysics
2004English

High-Responsivity UV-Vis Photodetector Based on Transferable WS2 Film Deposited by Magnetron Sputtering

Scientific Reports
Multidisciplinary
2016English

Impact of Secondary Gas-Phase Reactions on Microcrystalline Silicon Solar Cells Deposited at High Rate

Applied Physics Letters
AstronomyPhysics
2010English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy