Low Damage Etching of GaN Surfaces via Bias-Assisted Photoenhanced Electrochemical Oxidation in Deionized Water
Journal of Electronic Materials - United States
doi 10.1007/s11664-006-0009-0
Full Text
Open PDFAbstract
Available in full text
Categories
Date
January 9, 2007
Authors
Publisher
Springer Science and Business Media LLC