New Prospect of Successors to ArF Water-Immersion Lithography

Journal of Micro/ Nanolithography, MEMS, and MOEMS - United States
doi 10.1117/1.3454366
Full Text
Abstract

Available in full text

Date
Authors
Publisher

SPIE-Intl Soc Optical Eng

Related search

Successors of ArF Water-Immersion Lithography: EUV Lithography, Multi-E-Beam Maskless Lithography, or Nanoimprint?

Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic EngineeringCondensed Matter PhysicsMechanical EngineeringElectronicMolecular Physics,NanoscienceOpticalElectricalAtomicMagnetic MaterialsNanotechnologyOptics
2008English

High Refractive Index Fluid for Next Generation ArF Immersion Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2006English

The Need of Top Anti-Reflective Coating Materials for ArF Immersion Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2005English

Advancing Immersion Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2006English

Approaching the Numerical Aperture of Water Immersion Lithography at 193-Nm

2004English

Optical Materials for Immersion Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2005English

Responding to the Challenge: Materials Design for Immersion Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2006English

Receding Contact Lines: From Sliding Drops to Immersion Lithography

European Physical Journal: Special Topics
Materials ScienceTheoretical ChemistryPhysicsAstronomyPhysical
2011English

Immersion Lithography: Topcoat and Resist Processes

SPIE Newsroom
2007English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy