A Surface-Silylated Single-Layer Resist Using Chemical Amplification: A New Simpler Alternative for Multilayer Resist System.

Journal of Photopolymer Science and Technology - Japan
doi 10.2494/photopolymer.13.535
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Technical Association of Photopolymers, Japan

Related search

Photoresists for Microlithography Chemical Amplification in Resist Design

Journal of the Japan Society of Colour Material
1994English

A Novel Alicyclic Polymers for 193nm Single Layer Resist Materials.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1998English

New Etching System Using Alkylimidazolato Copper(II) Film as Etching Resist.

Circuit Technology
1988English

Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1997English

Spreading of Liquid Drop on Resist Film Surface

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2008English

Temporary Bonding With Polydimethylglutarimide Based Lift Off Resist as a Layer Transfer Platform

ECS Journal of Solid State Science and Technology
OpticalElectronicMagnetic Materials
2015English

Novolak Resist Removal Using Laser (266/532nm)

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2005English

Amyloid Cannot Resist Identification

Prion
BiochemistryMolecular NeuroscienceInfectious DiseasesCell BiologyCellular
2013English

Vertically Tapered Layers for Optical Applications Fabricated Using Resist Reflow

Journal of Micromechanics and Microengineering
Mechanics of MaterialsElectronic EngineeringMechanical EngineeringNanoscienceOpticalElectricalMagnetic MaterialsNanotechnologyElectronic
2009English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy