(PDF) Towards 11nm Half-Pitch Resolution for a

Towards 11nm Half-Pitch Resolution for a Negative-Tone Chemically Amplified Molecular Resist Platform for Extreme-Ultraviolet Lithography

doi 10.1117/12.2085672

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Abstract

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Date

March 20, 2015

Authors

Andreas Frommhold

Alexandra McClelland

Richard E. Palmer

Mark C. Rosamund

Alex P. G. Robinson

Publisher

SPIE

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