Silicon Oxynitride Films Deposited by Reactive High Power Impulse Magnetron Sputtering Using Nitrous Oxide as a Single-Source Precursor
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films - United States
doi 10.1116/1.4927493
Full Text
Open PDFAbstract
Available in full text
Date
September 1, 2015
Authors
Publisher
American Vacuum Society