(PDF) The Black Silicon Method II:The Effect of Mask

The Black Silicon Method II:The Effect of Mask Material and Loading on the Reactive Ion Etching of Deep Silicon Trenches

Microelectronic Engineering - Netherlands

doi 10.1016/0167-9317(94)00149-o

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Abstract

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Categories

Electronic Engineering

Condensed Matter Physics

Molecular Physics,

Magnetic Materials

Date

February 1, 1995

Authors

Johannes Burger

Miko Elwenspoek

Publisher

Elsevier BV

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