Growth and Properties of Amorphous Ti–B–Si–N Thin Films Deposited by Hybrid HIPIMS/DC-magnetron Co-Sputtering From TiB2 and Si Targets

Surface and Coatings Technology - Netherlands
doi 10.1016/j.surfcoat.2014.10.053
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Elsevier BV

Related search

Structural and Mechanical Properties of Amorphous AlMgB14 Thin Films Deposited by DC Magnetron Sputtering on Si, Al2O3 and MgO Substrates

Applied Physics A: Materials Science and Processing
Materials ScienceChemistry
2020English

Investigation of the Si–B–C–N Thin Coatings Deposited Using Magnetron Sputtering of SiBC Targets

Izvestiya Vuzov. Tsvetnaya Metallurgiya (Proceedings of Higher Schools. Nonferrous Metallurgy)
2015English

AlNxOy Thin Films Deposited by DC Reactive Magnetron Sputtering

Applied Surface Science
SurfacesAstronomyCondensed Matter PhysicsInterfacesFilmsCoatingsChemistryPhysics
2010English

Tribological Behavior of Ti-Al-Si-C-N Hard Coatings Deposited by Hybrid Arc-Enhanced Magnetron Sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2012English

Analysis of GaAs-Ti Thin Films Deposited by Sputtering Onto C-Si and GaAs

2009English

Properties of Amorphous SiC:O:H Films Prepared by Magnetron Sputtering of Si in CH4 and CO2.

SHINKU
2001English

Amorphous SiCS:H Films Prepared by Magnetron Sputtering of Si in CH4 and H2S

SHINKU
2003English

Microstructure and Properties of CrAlSiN Coatings Deposited by HiPIMS and Direct-Current Magnetron Sputtering

Coatings
SurfacesFilmsCoatingsMaterials ChemistryInterfaces
2019English

The Structure and Properties of Sputter-Deposited Co-Si Alloy Thin Films

Journal of Physics Condensed Matter
Materials ScienceCondensed Matter Physics
2000English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy