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Comparison of Various Factors Affected TID Tolerance in FinFET and Nanowire FET

Applied Sciences (Switzerland) - Switzerland
doi 10.3390/app9153163
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Abstract

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Categories
InstrumentationMaterials ScienceFluid FlowEngineeringComputer Science ApplicationsProcess ChemistryTransfer ProcessesTechnology
Date

August 3, 2019

Authors
Hyeonjae WonIlsik HamYoungseok JeongMyounggon Kang
Publisher

MDPI AG


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