Amanote Research
Register
Sign In
Weatherability of Amorphous Carbon Films Synthesized by Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition
Sensors and Materials
- Japan
doi 10.18494/sam.2017.1503
Full Text
Open PDF
Abstract
Available in
full text
Categories
Materials Science
Instrumentation
Date
January 1, 2017
Authors
Unknown
Publisher
MYU K.K.
Related search
Plasma Enhanced Chemical Vapour Deposition of Hydrogenated Amorphous Silicon at Atmospheric Pressure
Plasma Sources Science and Technology
Condensed Matter Physics
High-Rate Deposition of Amorphous Silicon Thin Films by Atmospheric Pressure Plasma Chemical Vapor Deposition. (1st Report). Design and Production of the Atmospheric Pressure Plasma CVD Apparatus With Rotary Electrode.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
High-Rate Deposition of Amorphous Silicon Film by Atmospheric Pressure Plasma Chemical Vapor Deposition. (2nd Report). Investigation for Higher Deposition Rate.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Preparation of Titanium Nitride Films by Plasma-Enhanced Chemical Vapor Deposition (II)
SHINKU
Intrinsic P-Type ZnO Films Fabricated by Atmospheric Pressure Metal Organic Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Growth of Aligned Carbon Nanotubes on Carbon Microfibers by Dc Plasma-Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Growth of Carbon Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition at Low Temperature
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Ultra Water-Repellent Films With Controlled Surfaces Fabricated by Microwave Plasma-Enhanced Chemical Vapor Deposition.
Journal of the Surface Finishing Society of Japan
