High-Rate Deposition of Amorphous Silicon Thin Films by Atmospheric Pressure Plasma Chemical Vapor Deposition. (1st Report). Design and Production of the Atmospheric Pressure Plasma CVD Apparatus With Rotary Electrode.

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering - Japan
doi 10.2493/jjspe.65.1600
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Japan Society for Precision Engineering

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