Effects of Laser Photolysis of Hydrocarbons at 193 and 248 Nm on Chemical Vapor Deposition of Diamond Films

doi 10.1021/acs.cgd.8b00084.s001
Full Text
Abstract

Available in full text

Date

Unknown

Authors

Unknown

Publisher

American Chemical Society (ACS)

Related search

High Speed Deposition of Y2O3 Films by Laser-Assisted Chemical Vapor Deposition

Materials Transactions
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2005English

Stress Evolution in Nanocrystalline Diamond Films Produced by Chemical Vapor Deposition

Journal of Applied Physics
AstronomyPhysics
2006English

Tribological Properties of Nanocrystalline Diamond Films Deposited by Hot Filament Chemical Vapor Deposition

AIP Advances
NanotechnologyAstronomyPhysicsNanoscience
2012English

Growth of Diamond Thin Films by Electron Assisted and DC Plasma Chemical Vapor Deposition.

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
1987English

Photodissociation of the Propargyl and Propynyl (C3D3) Radicals at 248 and 193 Nm

Journal of Chemical Physics
MedicineTheoretical ChemistryAstronomyPhysicsPhysical
2009English

A Comparative Study of Three Different Chemical Vapor Deposition Techniques of Carbon Nanotube Growth on Diamond Films

Journal of Nanomaterials
Materials ScienceNanotechnologyNanoscience
2013English

Excimer-Laser-Induced Chemical Vapor Deposition of Copper Films From Copper Trifluoroacetylacetonate

Le Journal de Physique IV
1991English

Chemical Vapor Deposition of Azidoalkylsilane Monolayer Films

English

Radio‐frequency Plasma Chemical Vapor Deposition Growth of Diamond

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
1989English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2026 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy