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Material Sensitive Scanning Probe Microscopy of Subsurface Semiconductor Nanostructures via Beam Exit Ar Ion Polishing

Nanotechnology - United Kingdom
doi 10.1088/0957-4484/22/18/185702
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Abstract

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Categories
Mechanics of MaterialsElectronic EngineeringMechanical EngineeringMaterials ScienceNanoscienceElectricalBioengineeringNanotechnologyChemistry
Date

March 17, 2011

Authors
O V KolosovI GrishinR Jones
Publisher

IOP Publishing


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