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Residual Stress in Silicon Substrate With Shallow Trenches on Surface After Local Thermal Oxidation

JSME international journal. Ser. A, Mechanics and material engineering
doi 10.1299/jsmea1993.38.2_258
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Abstract

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Date

April 15, 1995

Authors
Hideo MiuraNaoto SaitoHiroyuki OhtaNoriaki Okamoto
Publisher

Japan Society of Mechanical Engineers


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