Amanote Research

Amanote Research

    RegisterSign In

Preparation of Hard CNx Films by Reactive Sputtering.

SHINKU
doi 10.3131/jvsj.44.306
Full Text
Open PDF
Abstract

Available in full text

Date

January 1, 2001

Authors
Yuki TOGASHIYuko HIROHATATomoaki HINO
Publisher

The Vacuum Society of Japan


Related search

Preparation of Molybdenum Oxide Films by Means of Reactive Sputtering

SHINKU
1972English

HfSiON Films Deposited by Radio Frequency Reactive Sputtering

2013English

AlNxOy Thin Films Deposited by DC Reactive Magnetron Sputtering

Applied Surface Science
SurfacesAstronomyCondensed Matter PhysicsInterfacesFilmsCoatingsChemistryPhysics
2010English

Preparation of SrTiO3 Films by Sputtering Using He Gas.

SHINKU
1995English

Reproducibility of Properties of SnOxThin Films Prepared by Reactive Sputtering

ElectroComponent Science and Technology
1985English

Synthesis of ZnO:N Thin Films by Reactive Dc Magnetron Sputtering

Lithuanian Journal of Physics
AstronomyPhysics
2010English

Properties of Tantalum Oxide Thin Films Prepared by Reactive Sputtering.

SHINKU
1988English

Preparation and Evaluation of LiMn2O4 Films Prepared by Sputtering Method

Transactions of the Materials Research Society of Japan
2013English

Preparation of N-Doped TiOx Films as Photocatalyst Using Reactive Sputtering With Dry Air

Materials Transactions
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2009English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2025 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy