Preparation of Molybdenum Oxide Films by Means of Reactive Sputtering

SHINKU
doi 10.3131/jvsj.15.15
Full Text
Abstract

Available in full text

Date
Authors
Publisher

The Vacuum Society of Japan

Related search

Preparation of Hard CNx Films by Reactive Sputtering.

SHINKU
2001English

Properties of Tantalum Oxide Thin Films Prepared by Reactive Sputtering.

SHINKU
1988English

Synthesis of Iron Oxide Films by Reactive Magnetron Sputtering Assisted by Plasma Emission Monitoring

Materials Chemistry and Physics
Materials ScienceCondensed Matter Physics
2019English

Oxygen Reduction Properties of Co Oxide and Pt Oxide Thin Films Prepared by Reactive Sputtering

Journal of Society of Materials Engineering for Resources of Japan
2008English

Characterizations of Nickel Oxide Thin Films Prepared by Reactive Radio Frequency Magnetron Sputtering

2015English

Characterization of Silver Oxide Films Formed by Reactive RF Sputtering at Different Substrate Temperatures

ISRN Optics
2014English

Effect of Ion Irradiation on Vanadium Oxide Thin Films Deposited by Reactive RF Sputtering Technique

International Journal of Recent Technology and Engineering
EngineeringManagement of TechnologyInnovation
2019English

HfSiON Films Deposited by Radio Frequency Reactive Sputtering

2013English

Reproducibility of Properties of SnOxThin Films Prepared by Reactive Sputtering

ElectroComponent Science and Technology
1985English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy