Amanote Research
Register
Sign In
Reverse Gate Bias Stress on High-Voltage AlGaN/GaN-on-Si Heterostructure FETs
doi 10.7567/ssdm.2012.f-9-1
Full Text
Open PDF
Abstract
Available in
full text
Date
September 27, 2012
Authors
S. Choi
J. Lee
H. Yoon
H. Cha
H. Kim
Publisher
The Japan Society of Applied Physics
Related search
High-Voltage AlGaN/GaN HEMTs on Si Substrate With Implant Isolation
Field Plated AlGaN/GaN-on-Si HEMTs for High Voltage Switching Applications
Journal of the Korean Physical Society
Astronomy
Physics
Multi-Channel Tri-Gate Normally-on/Off AlGaN/GaN MOSHEMTs on Si Substrate With High Breakdown Voltage and Low ON-resistance
Applied Physics Letters
Astronomy
Physics
Effects of Substrate Defects on the Gate Leakage Current of AlGaN/GaN Heterojunction FETs Fabricated on Na Flux Bulk GaN
Comparison of Low-Temperature GaN, SiO2, and SiNx as Gate Insulators on AlGaN∕GaN Heterostructure Field-Effect Transistors
Journal of Applied Physics
Astronomy
Physics
Study on AlGaN/GaN Heterostructures Grown on Si Substrate
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
Axial Ge/Si Nanowire Heterostructure Tunnel FETs
Breakdown Mechanism in AlGaN/GaN HEMTs on Si Substrate
Suspended Tungsten Trioxide (WO3) Gate AlGaN/GaN Heterostructure Deep Ultraviolet Detectors With Integrated Micro-Heater
Optics Express
Optics
Atomic
Molecular Physics,