Amanote Research

Amanote Research

    RegisterSign In

Reverse Gate Bias Stress on High-Voltage AlGaN/GaN-on-Si Heterostructure FETs

doi 10.7567/ssdm.2012.f-9-1
Full Text
Open PDF
Abstract

Available in full text

Date

September 27, 2012

Authors
S. ChoiJ. LeeH. YoonH. ChaH. Kim
Publisher

The Japan Society of Applied Physics


Related search

High-Voltage AlGaN/GaN HEMTs on Si Substrate With Implant Isolation

2011English

Field Plated AlGaN/GaN-on-Si HEMTs for High Voltage Switching Applications

Journal of the Korean Physical Society
AstronomyPhysics
2011English

Multi-Channel Tri-Gate Normally-on/Off AlGaN/GaN MOSHEMTs on Si Substrate With High Breakdown Voltage and Low ON-resistance

Applied Physics Letters
AstronomyPhysics
2018English

Effects of Substrate Defects on the Gate Leakage Current of AlGaN/GaN Heterojunction FETs Fabricated on Na Flux Bulk GaN

2011English

Comparison of Low-Temperature GaN, SiO2, and SiNx as Gate Insulators on AlGaN∕GaN Heterostructure Field-Effect Transistors

Journal of Applied Physics
AstronomyPhysics
2005English

Study on AlGaN/GaN Heterostructures Grown on Si Substrate

Journal of the Vacuum Society of Japan
SurfacesInstrumentationInterfacesSpectroscopyMaterials Science
2011English

Axial Ge/Si Nanowire Heterostructure Tunnel FETs

2010English

Breakdown Mechanism in AlGaN/GaN HEMTs on Si Substrate

2010English

Suspended Tungsten Trioxide (WO3) Gate AlGaN/GaN Heterostructure Deep Ultraviolet Detectors With Integrated Micro-Heater

Optics Express
OpticsAtomicMolecular Physics,
2019English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2025 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy